Influence of Deposition Conditions on Properties of...

Japanese Journal of Applied Physics 1985 / 6 Vol. 24; Iss. Part 1, No

Influence of Deposition Conditions on Properties of Hydrogenated Amorphous Silicon Prepared by RF Glow Discharge

Nishikawa, Satoshi, Kakinuma, Hiroaki, Watanabe, Tsukasa, Nihei, Koji
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
24
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.24.639
Date:
June, 1985
File:
PDF, 1.03 MB
1985
Conversion to is in progress
Conversion to is failed