Role of Ions and Radical Species in Silicon Nitride...

Japanese Journal of Applied Physics 1987 / 5 Vol. 26; Iss. Part 2, No

Role of Ions and Radical Species in Silicon Nitride Deposition by ECR Plasma CVD Method

Hirao, Takashi, Setsune, Kentaro, Kitagawa, Masatoshi, Manabe, Yoshio, Wasa, Kiyotaka, Kohiki, Shigemi
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Volume:
26
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.26.L544
Date:
May, 1987
File:
PDF, 523 KB
english, 1987
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