Wafer Cleaning with Photoexcited Chlorine and Thermal...

Japanese Journal of Applied Physics 1989 / 10 Vol. 28; Iss. Part 1, No

Wafer Cleaning with Photoexcited Chlorine and Thermal Treatment for High-Quality Silicon Epitaxy

Watanabe, Satoru, Sugino, Rinshi, Yamazaki, Tatsuya, Nara, Yasuo, Ito, Takashi
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Volume:
28
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.28.2167
Date:
October, 1989
File:
PDF, 69 KB
english, 1989
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