Surface Hydrogen Desorption as a Rate-Limiting Process in...

Japanese Journal of Applied Physics 1990 / 10 Vol. 29; Iss. Part 2, No

Surface Hydrogen Desorption as a Rate-Limiting Process in Silane Gas-Source Molecular Beam Epitaxy

Hirose, Fumihiko, Suemitsu, Maki, Miyamoto, Nobuo
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Volume:
29
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.29.L1881
Date:
October, 1990
File:
PDF, 434 KB
1990
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