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Spectroscopic Study on N 2 O-Plasma Oxidation of Hydrogenated Amorphous Silicon and Behavior of Nitrogen
Masuda, Atsushi, Fukushi, Iwao, Yonezawa, Yasuto, Minamikawa, Toshiharu, Morimoto, Akiharu, Kumeda, Minoru, Shimizu, TatsuoVolume:
32
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.32.2794
Date:
June, 1993
File:
PDF, 241 KB
english, 1993