Charging Damages to Gate Oxides in a Helicon...

Japanese Journal of Applied Physics 1997 / 12 Vol. 36; Iss. Part 1, No

Charging Damages to Gate Oxides in a Helicon O 2 Plasma

Lin, Wendy, Kang, Tzong-Kuei, Perng, Yean-Chyi, Dai, Bau-Tong, Cheng, Huang-Chung
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Volume:
36
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.36.7362
Date:
December, 1997
File:
PDF, 771 KB
english, 1997
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