New Design Based Metrology for Fast Detection of Crucial...

Japanese Journal of Applied Physics 2011 / 6 Vol. 50; Iss. 6

New Design Based Metrology for Fast Detection of Crucial Lithographic Defects

Hur, Duck-Hyung, Kim, Tae-Heon, Park, Chul-Hong, Lee, Sang-Hoon, Yoo, Moon-Hyun, Cho, Jun-Dong
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Volume:
50
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.50.06GB11
Date:
June, 2011
File:
PDF, 532 KB
english, 2011
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