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Electron energy distribution function in capacitively coupled RF discharges: difference between electropositive Ar and electronegative SiH 4 discharges
Yan, M, Bogaerts, A, Goedheer, W J, Gijbels, RVolume:
9
Language:
english
Journal:
Plasma Sources Science and Technology
DOI:
10.1088/0963-0252/9/4/314
Date:
November, 2000
File:
PDF, 287 KB
english, 2000