Solid-Phase Lateral Epitaxial Growth onto Adjacent SiO...

Japanese Journal of Applied Physics 1982 / 3 Vol. 21; Iss. Part 2, No

Solid-Phase Lateral Epitaxial Growth onto Adjacent SiO 2 Film from Amorphous Silicon Deposited on Single-Crystal Silicon Substrate

Ohmura, Yamichi, Matsushita, Yoshiaki, Kashiwagi, Masahiro
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Volume:
21
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.21.L152
Date:
March, 1982
File:
PDF, 258 KB
english, 1982
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