Fabrication of Si:H Alloy with Plenty of -SiH...

Japanese Journal of Applied Physics 1983 / 9 Vol. 22; Iss. Part 2, No

Fabrication of Si:H Alloy with Plenty of -SiH 3 by Reactive Sputtering onto Low Temperature Substrate

Miyasato, Tatsuro, Abe, Yuji, Tokumura, Masao, Imura, Takeshi, Hiraki, Akio
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Volume:
22
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.22.L580
Date:
September, 1983
File:
PDF, 324 KB
english, 1983
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