Influence of rf Plasma in Plasma Cleaning Process on...

Japanese Journal of Applied Physics 1985 / 1 Vol. 24; Iss. Part 1, No

Influence of rf Plasma in Plasma Cleaning Process on Properties of Thin Superconducting Nb 3 Ge Films

Kato, Yujiro, Rogalla, Horst, David, Bernd
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Volume:
24
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.24.40
Date:
January, 1985
File:
PDF, 278 KB
english, 1985
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