Rapid Growth of AlN Films by Particle-Precipitation Aided Chemical Vapor Deposition
Komiyama, Hiroshi, Osawa, ToshioVolume:
24
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.24.L795
Date:
October, 1985
File:
PDF, 278 KB
english, 1985