![](/img/cover-not-exists.png)
Focused Ion Beam Lithography Using Novolak-Based Resist
Kojima, Yoshikatsu, Ochiai, Yukinori, Matsui, ShinjiVolume:
27
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.27.L1780
Date:
September, 1988
File:
PDF, 642 KB
1988