Focused Ion Beam Lithography Using Novolak-Based Resist

Japanese Journal of Applied Physics 1988 / 9 Vol. 27; Iss. Part 2, No

Focused Ion Beam Lithography Using Novolak-Based Resist

Kojima, Yoshikatsu, Ochiai, Yukinori, Matsui, Shinji
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
27
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.27.L1780
Date:
September, 1988
File:
PDF, 642 KB
1988
Conversion to is in progress
Conversion to is failed