Neutral-Beam-Assisted Etching of SiO 2...

Neutral-Beam-Assisted Etching of SiO 2 –A Charge-Free Etching Process–

Mizutani, Tatsumi, Yunogami, Takashi
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Volume:
29
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.29.2220
Date:
October, 1990
File:
PDF, 583 KB
1990
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