Neutral-Beam-Assisted Etching of SiO 2 –A Charge-Free Etching Process–
Mizutani, Tatsumi, Yunogami, TakashiVolume:
29
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.29.2220
Date:
October, 1990
File:
PDF, 583 KB
1990