![](/img/cover-not-exists.png)
Damage Induced by Electron Cyclotron Resonance Plasma Etching on Silicon Surface
Washidzu, Gen, Hara, Tohru, Hiyoshi, Jun, Sasaki, Masami, Suzuki, Yasuhiro, Ukai, KatsumiVolume:
30
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.30.1045
Date:
May, 1991
File:
PDF, 1.12 MB
english, 1991