Estimation of the Thickness of Ultrathin Silicon Nitride Films by X-Ray Photoelectron Spectroscopy
Muto, Akiko, Mine, Toshiyuki, Nakazawa, MasatoshiVolume:
32
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.32.3580
Date:
August, 1993
File:
PDF, 372 KB
english, 1993