![](/img/cover-not-exists.png)
Analysis of Sub-0.15 µm Pattern Replicationin Synchrotron Radiation Lithography
Kikuchi, Yukiko, Kondo, Kenzo, Nomura, Hiroshi, Gomei, YoshioVolume:
32
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.32.5960
Date:
December, 1993
File:
PDF, 5.82 MB
english, 1993