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Scaling Analysis of Chemical-Vapor-Deposited Tungsten Films by Atomic Force Microscopy
Yoshinobu, Tatsuo, Iwasaki, HiroshiVolume:
32
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.32.L1562
Date:
October, 1993
File:
PDF, 276 KB
english, 1993