Effects of $\bf N_{2}O$-Plasma Treatment of $\bf...

Japanese Journal of Applied Physics 1994 / 7 Vol. 33; Iss. Part 2, No

Effects of $\bf N_{2}O$-Plasma Treatment of $\bf a\mbox{-}SiO_{\ninmbi x}N_{\ninmbi y}$/$\bf a\mbox{-}SiN_{\ninmbi x}$ Gate Insulators on Electrical Stability of a-Si:H Thin-Film Transistors

Jen, Tean-Sen, Leu, Shyue-Ter, Chou, Tsung-Chih, Hong, Jyh-Wong, Chang, Chun-Yen
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Volume:
33
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.33.L977
Date:
July, 1994
File:
PDF, 531 KB
1994
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