Ultra-Shallow Depth Profiling of Arsenic Implants in...

Ultra-Shallow Depth Profiling of Arsenic Implants in Silicon by Hydride Generation-Inductively Coupled Plasma Atomic Emission Spectrometry

Matsubara, Atsuko, Kojima, Hisao, Itoga, Toshihiko, Kanehori, Keiichi
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
34
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.34.3965
Date:
August, 1995
File:
PDF, 462 KB
english, 1995
Conversion to is in progress
Conversion to is failed