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Ultra-Shallow Depth Profiling of Arsenic Implants in Silicon by Hydride Generation-Inductively Coupled Plasma Atomic Emission Spectrometry
Matsubara, Atsuko, Kojima, Hisao, Itoga, Toshihiko, Kanehori, KeiichiVolume:
34
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.34.3965
Date:
August, 1995
File:
PDF, 462 KB
english, 1995