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Self-Developing Properties of an Inorganic Electron Beam Resist and Nanometer-Scale Patterning Using a Scanning Electron Beam
Watanabe, Heiji, Fujita, Jun-ichi, Ochiai, Yukinori, Matsui, Shinji, Ichikawa, MasakazuVolume:
34
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.34.6950
Date:
December, 1995
File:
PDF, 148 KB
english, 1995