![](/img/cover-not-exists.png)
Characteristics of SiOF Films Formed by Remote Plasma Enhanced Chemical Vapor Deposition with $\bf SF_{6}$ Gas
Yu, Byoung-Gon, Kim, Kwang-Ho, Suh, Kyung-Soo, Baek, Jong TaeVolume:
35
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.35.L745
Date:
June, 1996
File:
PDF, 213 KB
english, 1996