Novel Proximity Effect Including Pattern-Dependent Resist...

Japanese Journal of Applied Physics 1997 / 12 Vol. 36; Iss. Part 1, No

Novel Proximity Effect Including Pattern-Dependent Resist Development in Electron Beam Nanolithography

Yamazaki, Kenji, Kurihara, Kenji, Yamaguchi, Toru, Namatsu, Hideo, Nagase, Masao
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Volume:
36
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.36.7552
Date:
December, 1997
File:
PDF, 1006 KB
english, 1997
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