Ru Electrode Deposited by Sputtering in Ar/O...

Japanese Journal of Applied Physics 1998 / 10 Vol. 37; Iss. Part 1, No

Ru Electrode Deposited by Sputtering in Ar/O 2 Mixture Ambient

Aoyama, Tomonori, Murakoshi, Atsushi, Imai, Keitaro
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Volume:
37
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.37.5701
Date:
October, 1998
File:
PDF, 1.94 MB
1998
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