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Plasma-Process-Induced Damage in Sputtered TiN Metal-Gate...

Japanese Journal of Applied Physics 2000 / 8 Vol. 39; Iss. Part 1, No

Plasma-Process-Induced Damage in Sputtered TiN Metal-Gate Capacitors with Ultrathin Nitrided Oxides

Chen, Chi-Chun, Lin, Horng-Chih, Chang, Chun-Yen, Chao, Tien-Sheng, Huang, Tiao-Yuan, Liang, Mong-Song
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Volume:
39
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.39.4733
Date:
August, 2000
File:
PDF, 625 KB
english, 2000
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