Anomalous Uphill Diffusion and Dose Loss of Ultra-Low-Energy Implanted Boron in Silicon during Early Stage of Annealing
Tsuji, Hiroshi, Furuhashi, Masayuki, Tachi, Masayuki, Taniguchi, KenjiVolume:
43
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.43.873
Date:
March, 2004
File:
PDF, 402 KB
english, 2004