Metal–Oxide–Semiconductor-Diode Characteristics with SiO...

Metal–Oxide–Semiconductor-Diode Characteristics with SiO 2 Films Formed by Oxidation and Sputtering Using Electron-Cyclotron-Resonance-Plasma Stream

Saito, Kunio, Jin, Yoshito, Ono, Toshiro, Shimada, Masaru
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Volume:
44
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.44.1031
Date:
February, 2005
File:
PDF, 315 KB
english, 2005
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