Dose Dependence of Recrystallization Processes in Amorphous...

Japanese Journal of Applied Physics 2005 / 8 Vol. 44; Iss. 8

Dose Dependence of Recrystallization Processes in Amorphous SiC

Bae, In-Tae, Ishimaru, Manabu, Hirotsu, Yoshihiko
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Volume:
44
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.44.6196
Date:
August, 2005
File:
PDF, 1.15 MB
english, 2005
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