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Ultraviolet Cross-Link Gap Fill Materials and Planarization Applications for Patterning Metal Trenches in 32–45 nm Via First Dual Damascene Process
Takei, Satoshi, Shinjo, Tetsuya, Horiguchi, YusukeVolume:
46
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.46.4074
Date:
July, 2007
File:
PDF, 330 KB
english, 2007