Resist Reflow Process for 32 nm Node Arbitrary Pattern

Japanese Journal of Applied Physics 2009 / 4 Vol. 48; Iss. 4

Resist Reflow Process for 32 nm Node Arbitrary Pattern

Park, Joon-Min, An, Ilsin, Oh, Hye-Keun
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Volume:
48
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.48.046501
Date:
April, 2009
File:
PDF, 492 KB
english, 2009
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