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Characteristics of Antisticking Layer Formed by CHF 3 Plasma Irradiation for Nanoimprint Molds
Okada, Makoto, Nakamatsu, Ken-ichiro, Kang, Yuji, Kanda, Kazuhiro, Haruyama, Yuichi, Matsui, ShinjiVolume:
48
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.48.06FH15
Date:
June, 2009
File:
PDF, 336 KB
english, 2009