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Retardation of Sb Diffusion in Si during Thermal Oxidation
Mizuo, Shoichi, Higuchi, HisayukiVolume:
20
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.20.739
Date:
April, 1981
File:
PDF, 647 KB
english, 1981