High-Rate Deposition of a-Si: H Film Using the...

Japanese Journal of Applied Physics 1982 / 10 Vol. 21; Iss. Part 2, No

High-Rate Deposition of a-Si: H Film Using the Decomposition of Mono-Silane

Nakayama, Yoshikazu, Natsuhara, Toshiya, Nagasawa, Nobuo, Kawamura, Takao
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Volume:
21
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.21.L604
Date:
October, 1982
File:
PDF, 170 KB
english, 1982
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