Behaviours of Thermally Induced Microdefects in Heavily...

Japanese Journal of Applied Physics 1983 / 1 Vol. 22; Iss. Part 2, No

Behaviours of Thermally Induced Microdefects in Heavily Doped Silicon Wafers

Tsuya, Hideki, Kondo, Yojiro, Kanamori, Masaru
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Volume:
22
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.22.L16
Date:
January, 1983
File:
PDF, 659 KB
english, 1983
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