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Secondary Defects in 2 MeV Phosphorus Implanted Silicon
Tamura, Masao, Natsuaki, NobuyoshiVolume:
25
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.25.L474
Date:
June, 1986
File:
PDF, 446 KB
english, 1986