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Amorphous Silicon Thin-Film Transistors with SiO x N y /SiN x Gate Insulators
Hiranaka, Kouichi, Yamaguchi, TadahisaVolume:
29
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.29.229
Date:
February, 1990
File:
PDF, 1.12 MB
1990