High Etch Rate Modes in Microwave Plasma Etching of Silicon...

Japanese Journal of Applied Physics 1990 / 11 Vol. 29; Iss. Part 1, No

High Etch Rate Modes in Microwave Plasma Etching of Silicon in High Magnetic Fields

Shindo, Haruo, Hashimoto, Tetsuro, Amasaki, Fumitake, Horiike, Yasuhiro
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Volume:
29
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.29.2641
Date:
November, 1990
File:
PDF, 317 KB
english, 1990
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