High Performance Electron Cyclotron Resonance Plasma...

Japanese Journal of Applied Physics 1991 / 11 Vol. 30; Iss. Part 1, No

High Performance Electron Cyclotron Resonance Plasma Etching with Control of Magnetic Field Gradient

Fujiwara, Nobuo, Sawai, Hisaharu, Yoneda, Masahiro, Nishioka, Kyusaku, Horie, Kazuo, Nakamoto, Kazuo, Abe, Haruhiko
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Volume:
30
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.30.3142
Date:
November, 1991
File:
PDF, 258 KB
english, 1991
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