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High Performance Electron Cyclotron Resonance Plasma Etching with Control of Magnetic Field Gradient
Fujiwara, Nobuo, Sawai, Hisaharu, Yoneda, Masahiro, Nishioka, Kyusaku, Horie, Kazuo, Nakamoto, Kazuo, Abe, HaruhikoVolume:
30
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.30.3142
Date:
November, 1991
File:
PDF, 258 KB
english, 1991