Bisazidobiphenyls/Novolak Resin Negative Resist Systems for...

Japanese Journal of Applied Physics 1992 / 12 Vol. 31; Iss. Part 1, No

Bisazidobiphenyls/Novolak Resin Negative Resist Systems for i-Line Phase-Shifting Lithography

Hattori, Keiko T., Hattori, Takashi, Uchino, Shouichi, Ueno, Takumi, Hayashi, Nobuaki, Shirai, Seiichiro, Moriuchi, Noboru, Morita, Masayuki
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Volume:
31
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.31.4307
Date:
December, 1992
File:
PDF, 2.74 MB
english, 1992
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