Simulation of AZ-PN100 Resist Pattern Fluctuation in X-Ray...

Japanese Journal of Applied Physics 1993 / 12 Vol. 32; Iss. Part 1, No

Simulation of AZ-PN100 Resist Pattern Fluctuation in X-Ray Lithography, Including Synchrotron Beam Polarization

Scheckler, Edward W., Ogawa, Taro, Tanaka, Toshihiko, Oizumi, Hiroaki, Takeda, Eiji
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Volume:
32
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.32.5951
Date:
December, 1993
File:
PDF, 232 KB
english, 1993
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