![](/img/cover-not-exists.png)
Effect of Phase Error on Lithographic Characteristics Using Attenuated Phase-Shifting Mask
Miyazaki, Junji, Nakae, Akihiro, Kusunose, Haruhiko, Yoshioka, Nobuyuki, Wakamiya, Wataru, Murayama, KeiichiVolume:
33
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.33.6785
Date:
December, 1994
File:
PDF, 839 KB
english, 1994