Photoresist Characteristics of Polyurea Films Prepared by...

Japanese Journal of Applied Physics 1994 / 12 Vol. 33; Iss. Part 2, No

Photoresist Characteristics of Polyurea Films Prepared by Vapor Deposition Polymerization

Sato, Masatoshi, Iijima, Masayuki, Takahashi, Yoshikazu
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Volume:
33
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.33.L1721
Date:
December, 1994
File:
PDF, 555 KB
english, 1994
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