A Novel Super-Resolution Technique for Optical Lithography...

Japanese Journal of Applied Physics 1994 / 2 Vol. 33; Iss. Part 2, No

A Novel Super-Resolution Technique for Optical Lithography -- Nonlinear Multiple Exposure Method

Ooki, Hiroshi, Komatsu, Masaya, Shibuya, Masato
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Volume:
33
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.33.L177
Date:
February, 1994
File:
PDF, 373 KB
english, 1994
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