X-Ray Lithography with a Wet-Silylated and Dry-Developed...

Japanese Journal of Applied Physics 1995 / 12 Vol. 34; Iss. Part 1, No

X-Ray Lithography with a Wet-Silylated and Dry-Developed Resist

Oizumi, Hiroaki, Yamashita, Yoshio, Ogawa, Taro, Soga, Takashi, Yamanaka, Ryoko
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Volume:
34
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.34.6734
Date:
December, 1995
File:
PDF, 203 KB
english, 1995
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