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Dual Function of Thin M o O 3 and W O 3 Films as Negative and Positive Resists for Focused Ion Beam Lithography
Hashimoto, Masahiro, Watanuki, Shinichi, Koshida, Nobuyoshi, Komuro, Masanori, Atoda, NobufumiVolume:
35
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.35.3665
Date:
June, 1996
File:
PDF, 231 KB
english, 1996