Charge Dissipation on Chemically Treated Thin Silicon Oxide...

Japanese Journal of Applied Physics 1997 / 6 Vol. 36; Iss. Part 1, No

Charge Dissipation on Chemically Treated Thin Silicon Oxide in Air

Uchihashi, Takayuki, Nakano, Akihiko, Ida, Tohru, Andoh, Yasuko, Kaneko, Reizo, Sugawara, Yasuhiro, Morita, Seizo
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Volume:
36
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.36.3755
Date:
June, 1997
File:
PDF, 653 KB
1997
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