Positive Ions in RF Discharge Plasmas of C 4...

Japanese Journal of Applied Physics 1998 / 10 Vol. 37; Iss. Part 1, No

Positive Ions in RF Discharge Plasmas of C 4 F 8 /Ar and C 4 F 8 /O 2 Mixtures

Hirose, Yuji, Ishikawa, Itsuo, Sasaki, Shinya, Nagaseki, Kazuya, Saito, Yukinori, Suganomata, Shinji
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Volume:
37
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.37.5730
Date:
October, 1998
File:
PDF, 179 KB
english, 1998
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