Effects of H 2 Addition in...

Japanese Journal of Applied Physics 2000 / 12 Vol. 39; Iss. Part 1, No

Effects of H 2 Addition in Magnetized Inductively Coupled C 2 F 6 Plasma Etching of Silica Aerogel Film

Wang, Seok-Joo, Park, Hyung-Ho, Yeom, Geun-Young
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Volume:
39
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.39.7007
Date:
December, 2000
File:
PDF, 538 KB
english, 2000
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