Low-Temperature Plasma-Enahanced Chemical Vapor Deposition...

Japanese Journal of Applied Physics 2001 / 1 Vol. 40; Iss. Part 1, No

Low-Temperature Plasma-Enahanced Chemical Vapor Deposition of Crystal Silicon Film from Dichlorosilane

Liu, Haiping, Jung, Sughoan, Fujimura, Yukihiro, Fukai, Chisato, Shirai, Hajime, Toyoshima, Yasutake
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Volume:
40
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.40.44
Date:
January, 2001
File:
PDF, 592 KB
english, 2001
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