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Enhanced Negative-Bias-Temperature Instability of P-Channel Metal-Oxide-Semiconductor Transistors due to Plasma Charging Damage
Lee, Da-Yuan, Lin, Horng-Chih, Wang, Meng-Feng, Tsai, Min-Yu, Huang, Tiao-Yuan, Wang, TahuiVolume:
41
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.41.2419
Date:
April, 2002
File:
PDF, 120 KB
english, 2002